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Multi-Layered Based Seed Methodology for Self-Aligned Silicides
An improved process for producing silicide deposits on silicon-based semiconductor chips, with a reduction in the number of lithography steps and phases required.
Published: 6/2/2009
|
Updated: 5/27/2009
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Inventor(s):
David Johnson
,
Jacob Jensen
Keywords(s):
Chemical
,
Materials Science
,
Nanoscience & Microtechnologies
,
ONAMI
Category(s):
Nanoscience & Microtechnologies
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